Gas System Upgrades

Notice of Intent The Office of Acquisition and Agreement Management (OAAM), of the National Institute of Standards and Technology (NIST), on behalf of the NIST Laboratories, intends to negotiate on a sole-source basis with Plasma Therm of SAINT PETERSBURG, FL, under the authority of FAR Part 13.106-1(b), as implemented by the Federal Acquisition Regulation(FAR) Part 13 for the procurement of gas system upgrades for its PlasmaTherm reactive ion etch system. The Acquisition Management Division (AMD) at the National Institute of Standards and Technology (NIST) intends to procure the required system under a Firm Fixed Price Purchase Order using Simplified Acquisition Procedures for Commercial Items (FAR Parts 12 and 13). The CNST NanoFab has a need for to update the gas panel on an existing PlasmaTherm reactive ion etch system. An etch system is used to selectively remove material from the surface of a substrate. The current system was manufactured in 2003 with limited five gas lines. In recent years, the number of research projects in NanoFab has grown dramatically, more process capabilities are being required. Adding a new gas line to the system will bring more users and develop more processes on the system. Only Plasma Therm's system is 100 percent compatible and adaptable with respect to the current reactive ion etch system. To develop more process capabilities for a broader user base, one more gas line is required to add on the system. The Plasma Therm Shuttleline operates with a proprietary control system and is not available from any vendor other than Plasma Therm. Adding a new gas line into the system needs to access the existing proprietary control scheme. No other manufacturer can guarantee compatibility with the current control system systems. For removability and control scheme requirements, and to ensure the data between the previous reactive ion etch system obtained from Plasma Therm, are not compromised, the new gas system upgrades must be obtained from Plasma Therm. Only Plasma Therm have the unique capabilities of providing the identical types of reactive ion etch system as required to ensure full compatibility, organizational control, and reproducibility for accurate remove material from the surface of a substrate. Plasma Therm is the sole source provider for the required system and is the only vendor able to provide the gas system upgrades that meets the Government's minimum requirements which makes them uniquely qualified. The North American Industry Classification System (NAICS) code for this acquisition 333242, with a size standard of 1,500 employees. A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement. No solicitation package will be issued. This notice of intent is not a request for competitive quotations. However, responses received by June 9, 2017 at 10 am Eastern Standard Time (EST) will be considered by the Government.