Metal Etch Inductively Coupled Plasma Reactive Ion Etching (ICP - RIE) Tool

The U.S. Department of Navy, Naval Research Laboratory (NRL) Contracting Division, proposes to enter into a sole source contract with Oxford Instruments America, Inc., for the procurement of an inductively coupled plasma reactive ion etcher (ICP-RIE) Tool using Chlorine and Fluorine chemistries in accordance with FAR 13.501(a) and 41 USC 1901, as no other system was capable of meeting the specifications required by NRL. The Tool must be capable of dry etching a wide variety of materials including but not limited to Metal Oxides, mixed Metal Oxides, Nitrides, Carbides, Silicides, Tellurides, Selenides, Nickel, Chrome, and Aluminum. The Tool is to be installed within a Class 100 clean room. It is intended for use by multiple users within that site, must be computer controlled via menu-driven software, and user friendly. The contemplated contract type will be a Firm Fixed Price (FFP). This notice is not a request for the receipt of proposals or competitive offers. A determination by the Government to compete or not, is solely within the discretion of the Government. The PSC is 3670 and the NAICS is 333242.