The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with Arradiance LLC, 11A Beaver Brook Rd., Littleton, MA 01460 for the purchase of one (1) atomic layer deposition system (ALD) to be utilized by NIST’s Physical Measurements Laboratory (PML). The statutory authority for this acquisition is 41 USC 3304(a)(1); FAR 13.106-1(b). ***** Sole source determination is based on the need to acquire one (1) atomic layer deposition system (ALD). This procurement will support PMLs efforts in the areas of integrated photonics, nanophotonics and metasurfaces by enabling the capability to deposit and pattern low-loss optical films, one atomic layer at a time, on a variety of substrates at different process conditions. Specifically, for low-loss nanophotonic devices operating in the visible, ultraviolet and deep-ultraviolet frequencies, NIST requires process recipes for atomic layer deposition of TiO2, HfO2, Al2O3 and conductive ITO films of thicknesses > 200 nm, at a process temperature that does not exceed 100 deg C. This last specification is the most critical since it is the melting temperature of patterned electron-beam resist (ZEP) used as the substrate on which these films are deposited (process referred to as Damascene lithography). Damascene lithography is one of the most critical technology for successful fabrication of integrated photonic devices at NIST, and forms the backbone for many of our internally and externally (DARPA) funded projects. In order to enable nanophotonic devices to be fabricated and tested under rigorously identical conditions, free of artifacts induced by variations in the deposition process itself and perform identically, it is NIST's intent to purchase an identical ALD system used and sold by Arradiance LLC. This is required to guarantee compatibility with our wafers and our process flow. Without obtaining a system with this compatibility NIST would need to invest significant time and effort in developing a new or modified version of existing process flows and would risk our goal to promote measurement reproducibility. This system is also the only one found that is benchtop, and capable of meeting the overall size requirement. A system that is not this size would not fit in the assigned lab due to stringent space constraints, and thus either require major lab renovation or identification of alternate laboratory space that may or may not be compatible. Arradiance LLC is the only vendor able to provide an atomic layer deposition system along with associated pumps, controllers and sensors, software and recipes able to meet the above requirements resulting from NIST's goal to both replicate existing recipes, ensure compatibility our existing process flow and maintain reproducibility. The Arradiance LLC is the sole manufacturer and distributor of the equipment that meets the required minimum specifications. *****The North American Industry Classification System (NAICS) code for this acquisition is 333242 – Semiconductor Machinery Manufacturing, with a small business size standard of 1,500 employees. *****A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement. *****No solicitation package will be issued. This notice of intent is not a request for quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. Interested parties that believe they can satisfy the requirements listed above must identify their capability in writing before the response date of this notice. Only responses received by 11:59 p.m. Eastern Standard Time on July 10, 2022 will be considered by the government. Responses shall be submitted via email to
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