Inductively Coupled Plasma Reactive Ion Etching

This is a request for information (RFI) issued by the Naval Research Lab (NRL) for information and planning purposes only. The purpose of this RFI is to determine if there are any businesses capable of satisfying the Government's requirement. NRL has a requirement for: "Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) Tool." Interested sources may provide a capabilities statement for the requirement. Attached to this document is the Specifications for the requirement. No quotes are being requested or accepted under this RFI. Capabillities statement and feedback addressing the clarity, feasibility, scope, and potential alternative means of meeting the Government's requirement is sought. The anticipated North American Industry Classification System code (NAICS) for the requirement is 333242 (Semiconductor Machinery Manufacturing). The business siza standard is 1,500 employees. Your response should identify your business size (large of small) in relation to this NAICS code. Please transmit responses by email to Kevin Nguyen, Contract Specialist, at [email protected]. All responses must be received on or before 26 April 2019, 03:00 PM EST.